Course: microtechnology structuring

Course no. :n/a
ECTS credits:3
Lecturer(s):Prof. Dr. H. Lenz-Strauch
Available: winter term summer term
Course type:Lecture/practical exercises
Exam type:???
Exam requirements:profound skills in production and manufacturing of materials in microtechnology, lithography and etching techniques, building of MEMS, test proceedures in microtechnology
Objectives:The students are able to explain and classify the basic methods of microsystem engineering. They can illustrate the operational sequences and processes of photolithographic structuring and etching technologies. The students are able to describe the thereby applied machines. For the cleanroom environment the students can name motivation, setup and components. They have knowledge about chosen processes of assembly- and packaging technologies
Course contents:Photolithography: Photo resists, masks and exposure technologies
Cleanroom technology: Setup, components, behaviour,
Materials
Etching technology: Wet- and dry etching technologies, physical and chemical etching technologies
Chosen processes of assembly- and packaging technologies
scanning electron microscopy (SEM), atomic force microscopy (AFM)
Literature:W. Menz, W. Mohr, O. Paul: Mikrosystemtechnik für Ingenieure, Wiley - VCH 2005
W. Ehrfeld: Handbuch Mikrotechnik, Hanser 2002
P. Rai-Choudhury : Handbook of Microlithography, Micromachining and Microfabrication, SPIE Optical Engineering Press 1997
S. Büttgenbach: Mikrosystemtechnik, Teubner 1994
available in modul:technical compulsory elective bachelor in semester 6