Course: microtechnology thin-film technology

Course no. :n/a
ECTS credits:3
Lecturer(s):Prof. Dr.-Ing. S. Gaßmann, Prof. Dr. H. Lenz-Strauch
Available: winter term summer term
Course type:Lecture/practical exercises
Exam type:???
Exam requirements:skills in cleanroom techology and vaccuum technology, profound skills in gas phase transport reactions and thin-film technology (CVD and PVD)
Objectives:The students have basic knowledge about the most important machines and tools of micro system engineering. They can use the necessary basics of vacuum technology and they are able to describe the basic functions of the various coating machines. For measuring and generation of layers they can name specific technologies.
Course contents:Vacuum technology: Vacuum physics, vacuum generation, vacuum measuring;
Coating machines: PVD, CVD and electroplating processes
Layer measuring: interferometric methods;
Literature:S. Büttgenbach: Mikrosystemtechnik, Teubner
W. Menz, W. Mohr, O. Paul: Mikrosystemtechnik für Ingenieure, Wiley - VCH
M. Wutz, H. Adam, W. Walcher: Handbuch Vakuumtechnik; Vieweg
H. Frey, G. Kienel: Dünnschichttechnologie; VDI Verlag
available in modul:technical compulsory elective bachelor in semester 6